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Table 4 Multiple regression analysis of inorganic arsenic metabolites by work group

From: Assessment of Arsenic Exposure by Measurement of Urinary Speciated Inorganic Arsenic Metabolites in Workers in a Semiconductor Manufacturing Plant

   Estimate Standard error P-value R 2
As 3+ * Ion implantation 0.53 0.21 0.02  
  Clean 0.66 0.23 0.01  
  Office reference    0.31
As 5+ * Ion implantation 0.90 0.32 0.01  
  Clean 1.38 0.36 <0.01  
  Office reference    0.40
MMA* Ion implantation 0.30 0.19 0.12  
  Clean 0.56 0.21 0.01  
  Office reference    0.24
DMA* Ion implantation 0.03 0.27 0.92  
  Clean 0.60 0.31 0.06  
  Office reference    0.16
As 3+ + As 5+* Ion implantation 0.61 0.20 0.01  
  Clean 0.82 0.23 <0.01  
  Office reference    0.37
As 3+ + As 5+ +MMA* Ion implantation 0.40 0.18 0.03  
  Clean 0.64 0.20 <0.01  
  Office reference    0.31
As 3+ + As 5+ +MMA + DMA* Ion implantation 0.08 0.25 0.75  
Clean 0.60 0.28 0.04  
  Office reference    0.18
  1. As3+: trivalent arsenic, As5+: pentavalent arsenic, GM, Geometric mean; GSD, Geometric standard deviation; MMA, Monomethylarsonic acid; DMA, Dimethylarsinic acid, Total: sum of inorganic arsenic metabolites (As3++ As5++MMA + DMA), * adjusted for smoking status, seafood intake.