Assessment of Arsenic Exposure by Measurement of Urinary Speciated Inorganic Arsenic Metabolites in Workers in a Semiconductor Manufacturing Plant

Table 4 Multiple regression analysis of inorganic arsenic metabolites by work group

		Estimate	Standard error	P-value	R ²
As ³⁺ *	Ion implantation	0.53	0.21	0.02
	Clean	0.66	0.23	0.01
	Office	reference			0.31
As ⁵⁺ *	Ion implantation	0.90	0.32	0.01
	Clean	1.38	0.36	<0.01
	Office	reference			0.40
MMA*	Ion implantation	0.30	0.19	0.12
	Clean	0.56	0.21	0.01
	Office	reference			0.24
DMA*	Ion implantation	0.03	0.27	0.92
	Clean	0.60	0.31	0.06
	Office	reference			0.16
As ³⁺ + As ^5+*	Ion implantation	0.61	0.20	0.01
	Clean	0.82	0.23	<0.01
	Office	reference			0.37
As ³⁺ + As ⁵⁺ +MMA*	Ion implantation	0.40	0.18	0.03
	Clean	0.64	0.20	<0.01
	Office	reference			0.31
As ³⁺ + As ⁵⁺ +MMA + DMA*	Ion implantation	0.08	0.25	0.75
As ³⁺ + As ⁵⁺ +MMA + DMA*	Clean	0.60	0.28	0.04
	Office	reference			0.18

As³⁺: trivalent arsenic, As⁵⁺: pentavalent arsenic, GM, Geometric mean; GSD, Geometric standard deviation; MMA, Monomethylarsonic acid; DMA, Dimethylarsinic acid, Total: sum of inorganic arsenic metabolites (As³⁺+ As⁵⁺+MMA + DMA), * adjusted for smoking status, seafood intake.

ISSN: 2052-4374